Our company's product is an MOCVD/CVD equipment for Semiconductor manufacturing which will be used in LED, micro-LED production lines to deposit TMD bilayers/trilayers on GaN-based micro-LED wafers. The TMD layers allow for monolithic integration of field effect transistors, reducing production costs by up to 50%.. TMDs offer a stackable alternative to silicon, increasing the number of transistors per unit area and lowering production costs and energy consumption. Our company enters the market by building an MOCVD system and partnering with key industrial players to integrate TMD materials into conventional systems.

Our deposition systems are designed for monolayer and bilayer growth of MoS2, WS2, etc. and have the following features:

• Optimized for growing ultra-thin 2D semiconductors in the micro-LED industry
• Compatible with current GaN technology in the micro-LED industry
• Fully automated and controlled by computer
• Remote monitoring and control of growth process
• Tailored to customer needs with possible AI integration
• Additional modules for post-deposition material modification or analysis can be added